Resist Development Status for Immersion Lithography
نویسندگان
چکیده
منابع مشابه
Development of an Immersion Maskless Lithography System
As lithography quickly approaches its limits with current technologies, a host of new ideas is being proposed in hopes of pushing lithography to new levels of performance. The work presented in this thesis explores the use of an immersion scheme to improve the performance of a maskless lithographic technique known as Zone-Plate-Array Lithography (ZPAL). This is believed to be the first implemen...
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........................................................................................................................................................ ii Acknowledgments ....................................................................................................................................... iii Publications............................................................................
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2005
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.18.641